Nanotechnology Now - Press Release: Nanonex Launches NX-2600 Tool to Offer Sub-5 nm Imprinting Resolution and Sub-1 Micrometer Alignment Accuracy

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NX-2600

Abstract:
Nanonex launches new NX-2600 tool which combines full wafer nanoimprinter and photolithography aligner to offer sub-5 nm imprinting resolution and sub-1 micrometer alignment accuracy

Nanonex Launches NX-2600 Tool to Offer Sub-5 nm Imprinting Resolution and Sub-1 Micrometer Alignment Accuracy

Princeton, NJ | Posted on November 3rd, 2010

Nanonex Corporation, the inventor and world's leading provider in nanoimprint lithography solutions with the longest history, is proud to launch its new Nanonex NX-2600 tool for supporting the cutting edge nano-/micro-technologies.

The Nanonex NX-2600 is a full wafer nanoimprinter and photolithography aligner. It is capable of all imprint forms: thermal, photo-curable, embossing and photolithography, with sub-5nm imprinting resolution and sub-1 micrometer alignment accuracy. Based on the Nanonex unique patented Air Cushion PressTM technology, the NX-2600 offers unsurpassed uniformity regardless of backside topology, wafer or mask flatness, or backside contamination. This ACP technology also eliminates lateral shifting between the mask and substrate, which significantly increases mask lifetime.

Nanonex has successfully delivered the NX-2600 tools to Wright-Patterson Laboratory, University of Massachusetts at Lowell and University of Cincinnati. The multifunctional NX-2600 will be used to support the cutting edge nano-/micro-technologies research and development at these top tier research laboratories.

For more detailed information about NX-2600 tool, nanoimprint solution and application please visit Nanonex at: www.nanonex.com.

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About Nanonex
Nanonex Corporation is the inventor of “nanoimprint lithography”, the world’s first nanoimprint lithography company, and the world’s leading provider of nanoimprint solutions that include equipment, masks, resists and processes. Nanonex’s patented and proprietary nanoimprint lithography (NIL) solutions and Air-Cushion PressTM can manufacture 3D nanostructures with sub-5 nm resolution, large-area uniformity, accurate overlay alignment, high throughput, and low cost. Nanonex NIL solutions have been adopted by a broad spectrum of industry applications, such as optical devices, data storage, displays, light emitting diodes, semiconductor ICs, biotech, chemical synthesis, and advanced materials. Nanonex has over 100 customers and an installed base of more than 50 tools world-wide.

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Contacts:
Nanonex Corp.
1 Deer Park Drive, Suite O
Monmouth Junction, NJ 08852
Tel: 732-355-1600
Fax: 732-355-1608

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