Nanotechnology Now - Press Release: Nanometrics Selected for Fab-Wide Process Control Metrology by Domestic China 3D-NAND Manufacturer: Latest Fab Win Includes Comprehensive Suite for Substrate, Thin Film and Critical Dimension Metrology

Home > Press > Nanometrics Selected for Fab-Wide Process Control Metrology by Domestic China 3D-NAND Manufacturer: Latest Fab Win Includes Comprehensive Suite for Substrate, Thin Film and Critical Dimension Metrology

Abstract:
Nanometrics Incorporated (NASDAQ:NANO), a leading provider of advanced process control solutions, today announced that a domestic China 3D-NAND manufacturer has selected Nanometrics for fab-wide process control. Nanometrics’ suite of substrate, thin film and critical dimension metrology solutions, including QS3300 FTIR, Atlas® II+, IMPULSE®+ and NanoDiffract® software, will be deployed for critical 3D-NAND device measurement and control. Nanometrics systems will be installed in the coming quarters to qualify the production line and enable a rapid yield ramp.

Nanometrics Selected for Fab-Wide Process Control Metrology by Domestic China 3D-NAND Manufacturer: Latest Fab Win Includes Comprehensive Suite for Substrate, Thin Film and Critical Dimension Metrology

Milpitas, CA | Posted on February 7th, 2018

“We have worked closely with this customer in developing a comprehensive process control metrology solution to support high-volume manufacturing of 3D-NAND devices,” commented Dr. Pierre-Yves Lesaicherre, president and chief executive officer of Nanometrics. “This new selection is another endorsement of our team and technology. Customers recognize our industry-leading applications support and proven solutions for 3D-NAND production flows, minimizing their risks in the key ramp phase of a new factory. By partnering with customers to leverage our extensive experience in 3D process control, our solutions will support rapid factory qualification and in-line process control into all of their 3D-NAND processes.”

The Atlas and IMPULSE platforms provide rapid, non-destructive in-line control for fabrication of advanced 3D-NAND devices, including support for thin film deposition, plasma etch and chemical mechanical polish (CMP). When combined with Nanometrics’ proprietary NanoDiffract 3D modeling and analysis software, the solution enables high-fidelity, high-accuracy insight for complex three-dimensional devices.

####

About Nanometrics Incorporated
Nanometrics is a leading provider of advanced, high-performance process control metrology and inspection systems used primarily in the fabrication of semiconductors and other solid-state devices, including sensors, optoelectronic devices, high-brightness LEDs, discretes and data storage components. Nanometrics' automated and integrated metrology systems measure critical dimensions, device structures, topography and various thin film properties, including three-dimensional features and film thickness, as well as optical, electrical and material properties. The company's process control solutions are deployed throughout the fabrication process, from front-end-of-line substrate manufacturing, to high-volume production of semiconductors and other devices, to advanced three-dimensional wafer-level packaging applications. Nanometrics' systems enable advanced process control for device manufacturers, providing improved device yield at reduced manufacturing cycle time, supporting the accelerated product life cycles in the semiconductor and other advanced device markets. The company maintains its headquarters in Milpitas, California, with sales and service offices worldwide. Nanometrics is traded on NASDAQ Global Select Market under the symbol NANO. Nanometrics' website is http://www.nanometrics.com.

Forward Looking Statements
Certain statements in this press release are forward-looking statements that involve a number of risks and uncertainties that could cause actual results to differ materially from those described in this release. Although Nanometrics believes that the expectations reflected in the forward-looking statements are reasonable, actual results could differ materially from these expectations due to a variety of factors, including, but not limited to: Nanometrics’ inability to ship products as scheduled or achieve customer acceptance of new products; shifts in the timing of customer orders and product shipments; and general economic conditions. For additional information and considerations regarding the risks faced by Nanometrics that could cause actual results to differ materially, see its annual report on Form 10-K for the year ended December 31, 2016, as filed with the Securities and Exchange Commission on March 3, 2017 including under the caption “Risk Factors,” as well as other periodic reports filed with the SEC from time to time. Nanometrics disclaims any obligation to update information contained in any forward-looking statement, except as required by law.

For more information, please click here

Contacts:
Investor Relations Contact:
Claire McAdamsHeadgate Partners LLC
530.265.9899

Company Contact:
Kevin Heidrich
SVP Corporate Development
503.207.4611

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark: