Nanotechnology Now - Press Release: Synopsys Joins CEA-Leti’s IMAGINE Program on Maskless Lithography: Leading Software Provider Is 10th Industrial Partner to Join IMAGINE

Home > Press > Synopsys Joins CEA-Leti’s IMAGINE Program on Maskless Lithography: Leading Software Provider Is 10th Industrial Partner to Join IMAGINE

Abstract:
CEA-Leti today announced that Synopsys, Inc., a world leader in software and IP used in the design, verification and manufacture of electronic components and systems, has joined the IMAGINE program designed to develop maskless lithography for IC manufacturing. Synopsys is the 10th industrial partner to join IMAGINE.

Synopsys Joins CEA-Leti’s IMAGINE Program on Maskless Lithography: Leading Software Provider Is 10th Industrial Partner to Join IMAGINE

Grenoble, France | Posted on September 19th, 2011

CEA-Leti and MAPPER Lithography launched the program in July 2009 with the delivery of MAPPER's Massively Parallel Electron Beam Platform to Leti.

The MAPPER platform is the core technology on which the IMAGINE program is built. This program provides the world's major chip manufacturers with the opportunity to assess maskless lithography technology in a real manufacturing environment. In addition, it will develop and qualify the complete infrastructure, from data preparation to process integration, in preparation for its industrial introduction in 2015.

"Maskless lithography has emerged as a contender for extending IC manufacturing to technology nodes below 15 nanometers. The IMAGINE program brings together leaders from all areas of IC manufacturing in the assessment and deployment of this technology," said Fabio Angelillis, vice president engineering of the Silicon Engineering Group at Synopsys. "Synopsys is pleased to contribute its technology leadership in mask tools, including mask synthesis and mask data preparation, to help drive effective software solutions for the IMAGINE program."

"One of the key points for the ML2 technology is the ability to handle very large data files, and we will need to quickly establish the proper data format standard," said Serge Tedesco, CEA-Leti program manager. "Having Synopsys' extensive experience in helping define data format and solutions to related issues will be essential to our success."

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About CEA-Leti
Leti is an institute of CEA, a French research-and-technology organization with activities in energy, IT, healthcare, defence and security. Leti is focused on creating value and innovation through technology transfer to its industrial partners. It specializes in nanotechnologies and their applications, from wireless devices and systems, to biology, healthcare and photonics. NEMS and MEMS are at the core of its activities. An anchor of the MINATEC campus, CEA-Leti operates 8,000-m² of state-of-the-art clean room space on 200mm and 300mm wafer platforms. It employs 1,400 scientists and engineers and hosts more than 190 Ph.D. students and 200 assignees from partner companies. CEA-Leti owns more than 1,700 patent families.

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Contacts:
CEA-LETI
Serge Tedesco
Phone: +33 4 38 78 49 89
Email:

Thierry Bosc
Phone: +33 4 38 78 31 95
Email:

Agency
Amélie Ravier
Phone: +33 1 58 18 59 30
Email: