Home > News > Nowy fotorezyst dla technologii 20 nanometrów
November 17th, 2009
Nowy fotorezyst dla technologii 20 nanometrów
Abstract:
Toshiba poinformowała o opracowaniu fotorezystu, który współpracuje z litografią w ekstremalnie dalekim ultrafiolecie (EUV) i jest pierwszym nadającym się do wykorzystania w 20-nanometrowym procesie produkcyjnym.
Szczegóły wynalazku zostaną omówione podczas 22nd International Microprocesses and Nanotechnology Conference, która odbędzie się 19 listopada w Sapporo.
Source:
kopalniawiedzy.pl
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