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June 26th, 2007

An ultralow-cost, large area way for nanoelectronics fabrication

Abstract:
Nanoimprinting lithography (NIL) is a simple pattern transfer process that is emerging as an alternative nanopatterning technology to traditional photolithography. NIL allows the fabrication of two-dimensional or three-dimensional structures with submicrometer resolution and the patterning and modification of functional materials. A key benefit of nanoimprint lithography is its sheer simplicity. There is no need for complex optics or high-energy radiation sources with a nanoimprint tool. There is no need for finely tailored photoresists designed for both resolution and sensitivity at a given wavelength. The simplified requirements of the technology allow low-cost, high-throughput production processes of various nanostructures with operational ease. NIL already has been applied in various fields such as biological nanodevices, nanophotonic devices, organic electronics, and the patterning of magnetic materials. Researchers at Berkeley have taken this process one step further by demonstrating that direct nanoimprinting of metal nanoparticles enables low temperature metal deposition as well as high-resolution patterning. This approach has substantial potential to take advantage of nanoimprinting for the application in ultralow cost, large area printed electronics.

Source:
nanowerk.com

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