Home > News > Obducat receives first NIL patent granted in Japan
August 4th, 2006
Obducat receives first NIL patent granted in Japan
Abstract:
Obducat have received notification from the Japanese patent office that it will issue a patent for an invention concerning functionality within Obducat’s NIL technology (nano imprint lithography) called parallelization. The technology offers performance advantages in comparison with competing parallelization technologies.
Source:
Obducat
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