Home > News > Obducat tips 300-mm nano-imprint litho
October 12th, 2005
Obducat tips 300-mm nano-imprint litho
Abstract:
The Swedish company appears to be aiming its future tools for chip-production at the 32-nm node and beyond. Nano-imprint is among the lithography candidates for IC production at 32-nm and beyond. Other possible hopefuls include extreme ultraviolet (EUV), immersion lithography and maskless.
Source:
EETimes
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