Home > News > Darpa, NIST to end funding U.S. maskless lithography
January 20th, 2005
Darpa, NIST to end funding U.S. maskless lithography
Abstract:
U.S. vendors were told behind the scenes that the National Institute of Standards and Technology (NIST) will not fund any new U.S. projects for maskless lithography in 2005.
Defense Advanced Research Projects Agency (Darpa) reportedly plans to cease funding for maskless lithography in the United States in 2006. Maskless lithography promises to give chip makers some relief from the soaring costs of photomasks, which are expected to carry price tags of $3 million at the 65-nm node and $6 million at 45-nm.
Source:
eetimes
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Defense Advanced Research Projects Agency
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