Home > News > Inorganic spin coat process readied for TFTs
March 17th, 2004
Inorganic spin coat process readied for TFTs
Abstract:
A new spin-on process for inorganic semiconductor films developed at IBM Corp.'s Thomas J. Watson Research Center could usher in a new phase for electronics based on thin-film transistor (TFT) technology. The novel aspect of the process is the use of a catalyst to facilitate the formation of very thin 50-nm films consisting of chalcogenide compounds that act as the channel for TFTs.
Source:
EETimes
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