Home > News > IMEC breakthrough removes barriers to sub-1nm
January 15th, 2004
IMEC breakthrough removes barriers to sub-1nm
Abstract:
IMEC, Europe's largest independent microelectronics and nanotechnology research center, announces that they have successfully demonstrated the use of high-k dielectrics and metal gates to values below one nanometer. Achieving this level of electrical performance using materials other than the traditional polysilicon-based counterparts removes one of the industry's so-called 'red brick wall' barriers to advancing semiconductor technology.
Source:
IMEC
Bookmark:
| Related News Press |
Chip Technology
New ocelot chip makes strides in quantum computing: Based on "cat qubits," the technology provides a new way to reduce quantum errors February 28th, 2025
Enhancing transverse thermoelectric conversion performance in magnetic materials with tilted structural design: A new approach to developing practical thermoelectric technologies December 13th, 2024
Bringing the power of tabletop precision lasers for quantum science to the chip scale December 13th, 2024
Discoveries
Closing the gaps — MXene-coating filters can enhance performance and reusability February 28th, 2025
Rice researchers harness gravity to create low-cost device for rapid cell analysis February 28th, 2025
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||