Home > News > IMEC breakthrough removes barriers to sub-1nm
January 15th, 2004
IMEC breakthrough removes barriers to sub-1nm
Abstract:
IMEC, Europe's largest independent microelectronics and nanotechnology research center, announces that they have successfully demonstrated the use of high-k dielectrics and metal gates to values below one nanometer. Achieving this level of electrical performance using materials other than the traditional polysilicon-based counterparts removes one of the industry's so-called 'red brick wall' barriers to advancing semiconductor technology.
Source:
IMEC
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