Home > Press > Governor Cuomo announces $5 million private investment and 150 new high-tech jobs at SUNY College of Nanoscale Science and Engineering
Abstract:
Ten Global Companies to Spearhead Construction and Infrastructure for 450mm Computer Chip Fabs, Further Positioning New York as World Leader in Design of Advanced Manufacturing Facilities.
Governor Andrew M. Cuomo today announced more than $5 million in new private investment and the creation of up to 150 high-tech jobs through the formation of the Facility 450 Consortium (F450C) at SUNY's College of Nanoscale Science and Engineering (CNSE). This first-of-its-kind partnership of ten leading nanoelectronics facility companies from around the world will collaborate at CNSE to lead the global effort to design and build the next-generation 450mm computer chip fabrication (chip fab) facilities.
"This significant private investment will accelerate our efforts to build the next generation of advanced manufacturing facilities in the nanotechnology industry and create good paying, high-tech jobs right here in the Capital Region," Governor Cuomo said. "We are proud to host this unique private-public partnership here at the College of Nanoscale Science and Engineering that will help New York State stay at the forefront of the nanotechnology industry and grow our economy."
"In further advancing the vision and leadership of Governor Cuomo in making New York the undisputed home of 21st century innovation and economic prosperity, we are delighted to see the nanoelectronics industry continue to coalesce at the College of Nanoscale Science and Engineering," said Dr. Alain Kaloyeros, CNSE Senior Vice President and CEO. "It is clear that New York is the centerpiece of the industry's critical evolution to 450mm wafer technology, and in accordance with the Governor's strategic blueprint, we look forward to working with our corporate partners to enable a seamless transition to advanced manufacturing that reduces cost, improves efficiency, and enhances environmental sustainability."
This effort follows the September 2011 announcement by Governor Cuomo and spearheaded by CNSE, to partner with Intel, IBM, GLOBALFOUNDRIES, TSMC, and Samsung as part of the global consortium called G450C, to invest $4.8 billion to build a world first, wafer and equipment development environment to enable a cost effective and timely transition from current 300mm wafer technology into the new 450mm technology.
Today's announcement brings additional investment in nanoelectronics from 10 companies from around the world that will collectively invest more than $5 million, and work closely with G450C to build the necessary infrastructure and facilities needed for the transition to 450mm technology. The 10 member companies that make up the F450C include Air Liquide, CH2M HILL, CS Clean Systems, Ceres Technologies, Edwards, Haws Corporation, Mega Fluid Systems, M+W Group, Ovivo, and Swagelok.
"It makes perfect sense to establish F450C at the NanoCollege, home to the world's most advanced 450mm facilities, infrastructure, and consortia, where we can extend this industry-leading effort into the construction and infrastructure requirements for next-generation 450mm fabs," said Rick Whitney, CEO of M+W US Inc. "The industry understands that 450mm facility challenges require collaboration across the entire value chain. Working alongside G450C, F450C allows us to align on facility standards with industry partners and drive operational costs and duration improvements to provide long-term benefits. Without this collective support, our goal of developing viable 450mm solutions would not be possible."
The F450C program was initiated after M+W Group was selected to support the development of new facility and infrastructure technologies, and to manage building and facility suppliers participating in the G450C. Members of F450C and G450C will work together to identify viable solutions required for 450mm high-volume facility construction, with initial focus areas to include reducing tool installation cost and duration, and improving facility sustainability.
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About UAlbany NanoCollege
CNSE is the first college in the world dedicated to education, research, development and deployment in the emerging disciplines of nanoscience, nanoengineering, nanobioscience and nanoeconomics. With more than $14 billion in high-tech investments, CNSE represents the world's most advanced university-driven research enterprise, offering students a one-of-a-kind academic experience and providing over 300 corporate partners with access to an unmatched ecosystem for leading-edge R&D and commercialization of nanoelectronics and nanotechnology innovations. CNSE's footprint spans upstate New York, including its Albany NanoTech Complex, an 800,000-square-foot megaplex with the only fully-integrated, 300mm wafer, computer chip pilot prototyping and demonstration line within 85,000 square feet of Class 1 capable cleanrooms. More than 3,100 scientists, researchers, engineers, students and faculty work here, from companies including IBM, Intel, GlobalFoundries, SEMATECH, Samsung, TSMC, Toshiba, Applied Materials, Tokyo Electron, ASML and Lam Research. An expansion now underway, part of which will house the world's first Global 450mm Consortium, will add nearly 500,000 square feet of next-generation infrastructure, an additional 50,000 square feet of Class 1 capable cleanrooms, and more than 1,000 scientists, researchers and engineers from CNSE and global corporations. In addition, CNSE's Solar Energy Development Center in Halfmoon provides a prototyping and demonstration line for next-generation CIGS thin-film solar cells, supporting its leadership of the U.S. Photovoltaic Manufacturing Consortium (PVMC). CNSE's Smart System Technology and Commercialization Center of Excellence (STC) in Rochester offers state-of-the-art capabilities for MEMS fabrication and packaging. CNSE also co-founded and manages operations at the Computer Chip Commercialization Center at SUNYIT in Utica and is a co-founder of the Nanotechnology Innovation and Commercialization Excelerator in Syracuse.
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