Nanotechnology Now

Our NanoNews Digest Sponsors
Heifer International



Home > Press > SUSS MicroTec launches 300mm Coat/Develop Cluster enhanced for 3D Integration

Frontview ACS300 Gen2 modular coat/bake/develop system from SUSS MicroTec (Photo: Business Wire)
Frontview ACS300 Gen2 modular coat/bake/develop system from SUSS MicroTec (Photo: Business Wire)

Abstract:
At Semicon Korea 2009, SUSS MicroTec (FWB:SMH)(GER:SMH) unveiled the second generation of its ACS300, a modular system for coating, baking and developing of wafers up to 300mm. The ACS300 Gen2 offers unmatched configuration flexibility at market-leading cost of ownership. The system architecture and process modules are specifically adapted to the needs of the advanced packaging and 3D integration industry, which requires very thick photo resist layers of up to 100 microns and more. Combining best in class coat and develop uniformity with exceptional edge bead performance makes the ACS300 Gen2 the preferred solution for various special spin coating applications such photosensitive polymers like polyimide, PBO or Cyclotene™ (BCB).

SUSS MicroTec launches 300mm Coat/Develop Cluster enhanced for 3D Integration

MUNICH, Germany | Posted on January 19th, 2009

The ACS300 Gen2 continues the success of the preceding model, ACS300Plus with developments driving equipment cost down, extending overall equipment efficiency and scaling down of the footprint.

"Addressing the specific requirements for wafer level packaging and 3D integration the new ACS300 is equipped with various packaging specific features, which makes it specifically suited for applications like solder bumping, gold bumping or redistribution layers," said Rolf Wolf, General Manager of SUSS MicroTec Lithography Division. "The next generation ACS300 will definitively help SUSS MicroTec to continue and further expand its market leading position in the field of advanced packaging, and extending it into 3D processing."

####

About SUSS MicroTec
SUSS MicroTec is a leading supplier of process and test solutions for markets such as 3D Integration, Advanced Packaging, MEMS, Nanotechnology and Compound Semiconductor. High-quality solutions enable customers to increase process performance while reducing cost of ownership.

SUSS MicroTec supports more than 8,000 installed mask aligners, coaters, bonders and probe systems with a global infrastructure for applications and service. SUSS MicroTec is headquartered in Garching near Munich, Germany.

All statements in this release other than historical facts are forward-looking statements within the meaning of U.S. Private Securities Litigation Reform Act of 1995. The company accepts no obligation toward the general public to update or correct forward-looking statements. All forward-looking statements are subject to various risks and uncertainties, as a result of which actual events may diverge numerically from expectations. The forward-looking statements reflect the view at the time they were made.

For more information, please click here

Contacts:
SUSS MicroTec
Brigitte Wehrmann
Marketing Communications Manager
SUSS MicroTec Lithography Division
Tel: +49 (0) 89 32007-237

Copyright © Business Wire 2009

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

Researchers demonstrates substrate design principles for scalable superconducting quantum materials: NYU Tandon–Brookhaven National Laboratory study shows that crystalline hafnium oxide substrates offer guidelines for stabilizing the superconducting phase October 3rd, 2025

Researchers develop molecular qubits that communicate at telecom frequencies October 3rd, 2025

Next-generation quantum communication October 3rd, 2025

"Nanoreactor" cage uses visible light for catalytic and ultra-selective cross-cycloadditions October 3rd, 2025

Chip Technology

Researchers demonstrates substrate design principles for scalable superconducting quantum materials: NYU Tandon–Brookhaven National Laboratory study shows that crystalline hafnium oxide substrates offer guidelines for stabilizing the superconducting phase October 3rd, 2025

Lab to industry: InSe wafer-scale breakthrough for future electronics August 8th, 2025

A 1960s idea inspires NBI researchers to study hitherto inaccessible quantum states June 6th, 2025

Programmable electron-induced color router array May 14th, 2025

Announcements

Rice membrane extracts lithium from brines with greater speed, less waste October 3rd, 2025

Researchers develop molecular qubits that communicate at telecom frequencies October 3rd, 2025

Next-generation quantum communication October 3rd, 2025

"Nanoreactor" cage uses visible light for catalytic and ultra-selective cross-cycloadditions October 3rd, 2025

Tools

Gap-controlled infrared absorption spectroscopy for analysis of molecular interfaces: Low-cost spectroscopic approach precisely analyzes interfacial molecular behavior using ATR-IR and advanced data analysis October 3rd, 2025

Japan launches fully domestically produced quantum computer: Expo visitors to experience quantum computing firsthand August 8th, 2025

Portable Raman analyzer detects hydrogen leaks from a distance: Device senses tiny concentration changes of hydrogen in ambient air, offering a dependable way to detect and locate leaks in pipelines and industrial systems April 25th, 2025

Rice researchers harness gravity to create low-cost device for rapid cell analysis February 28th, 2025

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project