Nanotechnology Now - Press Release: Picosun Re-introduces Tuomo Suntola inventor of ALD at ALD 2008 Conference

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Abstract:
At AVS ALD 2008, the 8th International Conference on Atomic Layer Deposition held in Bruges, Belgium, Finnish Atomic Layer Deposition (ALD) reactor manufacturer Picosun Oy today re-introduced Dr Tuomo Suntola, Finnish scientist who received the European SEMI award in 2004 for inventing the ALD method, to a whole new generation of ALD-enthusiasts.

Picosun Re-introduces Tuomo Suntola inventor of ALD at ALD 2008 Conference

BRUGES, BELGIUM | Posted on June 29th, 2008

At AVS ALD 2008, the 8th International Conference on Atomic Layer Deposition held in Bruges, Belgium, Finnish Atomic Layer Deposition (ALD) reactor manufacturer Picosun Oy today re-introduced Dr Tuomo Suntola, Finnish scientist who received the European SEMI award in 2004 for inventing the ALD method, to a whole new generation of ALD-enthusiasts.

"Dr Suntola has not been actively participating in ALD events during the past few years. That is why there is a complete generation of people working with ALD who have not had a chance to meet him in person before. He has, however, served as Executive Advisor to and, since 2007, Member of the Board of Directors of the Finnish ALD powerhouse Picosun. Picosun has been one of the best kept secrets of ALD, but the silence around the company has now been lifted," says Juhana Kostamo, Managing Director of Picosun.

"We have used the past four years to build a platform from which we will reach the top of the ALD world. We now have un-matched products both for R&D and production, the quality of which is not defined by empty advertising phrases but unparalleled hard measured facts from actual equipment used by some of the world's leading universities and research institutions. We now also have first actual user long-term measured results from our new SUNALE˙ P-series production reactors confirming that we have, indeed, products which master the most important thin film deposition equipment requirements - uniformity, repeatability and particle performance - with flying colours," Juhana Kostamo explains.
Dr Suntola and Picosun's Chief Technology Officer Sven Lindfors are available for discussions at the Picosun exhibition booth at the ALD 2008 conference today June 30th at 10:00-10:30 a.m.; 12:30-2:00 p.m.; 3:30-4:00 p.m. and from 5:30 p.m. onwards (Central European Time).

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About Picosun Oy
Picosun is an international ALD equipment manufacturer with world-wide sales and service. Picosun develops and manufactures ALD reactors for micro- and nanotechnology applications. Picosun represents continuity to over three decades of ALD reactor manufacturing in Finland. Picosun provides its customers with versatile, reliable and user-friendly ALD process tools, which offer unique scalability from research to production. Picosun is based in Espoo, Finland and has its U.S. headquarters in Detroit, Michigan. SUNALE ˙ ALD process tools are installed in various universities, research institutes and companies across Europe, USA and Asia. Doctor Tuomo Suntola, inventor of ALD technology is Member of the Board of Directors of Picosun. World‚s most experienced ALD reactor designer Sven Lindfors is Picosun´s Chief Technology Officer and one of the founders of the company. Picosun is a part of Stephen Industries Inc Oy.

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Contacts:
Picosun Oy
Juhana Kostamo
Tietotie 3
FI-02150 Espoo, Finland
Phone: +358 50 321 1955
Fax: +358 20 722 7012

Pekka Reinikainen
Phone: +358 40 7479312

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