Nanotechnology Now

Our NanoNews Digest Sponsors
Heifer International



Home > Press > SEMATECH’s Litho Forum Spotlights High-Stakes Shift to Next-Generation Manufacturing

Abstract:
The semiconductor industry's movers and shakers will gather May 12-14 at SEMATECH's bi-annual Litho Forum to debate how best to approach the high-stakes shift to 22 nm manufacturing.

SEMATECH’s Litho Forum Spotlights High-Stakes Shift to Next-Generation Manufacturing

Albany, NY | Posted on April 23rd, 2008

"Lithography is a huge investment for manufacturers and suppliers alike. Where companies place their bets will have a big effect on their bottom line," said Mike Lercel, director of SEMATECH's lithography division and conference chair.

The forum will be keynoted by John Warlaumont, vice president of technology for SEMATECH. The agenda includes sessions organized by leading industry experts:

* Extreme ultraviolet lithography - Janice Golda, director of lithography capital equipment development, Intel
* 193 double patterning lithography - David Medeiros, senior manager of patterning research, IBM @ Albany Nanotech
* 193 high index lithography - Will Conley, distinguished member of the technical staff, Technology Solutions Organization, Freescale Semiconductor
* Nanoimprint lithography - Lloyd Litt, SEMATECH project manager, Alternative Lithography, Advanced Micro Devices
* Maskless lithography - Burn Lin, senior director, Nanopatterning Technology, TSMC

Sessions will maximize discussion time, and attendees will be surveyed for their plans and preferences on lithographic approaches for future manufacturing. The survey will also assess how attendees perceive the development status of each option and its viability for the demands of large-scale manufacturing. Additional information is available at www.sematech.org.

Lithography is a capital-intensive process. A single piece of next-generation lithographic equipment is expected to cost in excess of $40 million. The risk embraces manufacturers and suppliers alike. For any single technology or approach to be considered commercially viable, at least two equipment suppliers must support it.

Lithography is a key process in the microfabrication of semiconductors. Light is used to transfer a geometric pattern from a photomask to a light-sensitive chemical photoresist on the substrate surface. A series of chemical treatments engraves the exposure pattern into the material underneath the photoresist. A CMOS wafer, for example, will go through the photolithographic cycle up to 50 times.

####

About SEMATECH®
EMATECH works with members and partners on a pre-competitive basis to drive innovation from the lab through the manufacturing process. At the industry level, the organization plays a major role in arbitrating generational shifts by hosting industry-wide forums to foster dialogue and build consensus and helps maintain the International Technology Roadmap for Semiconductors (ITRS), a 15-year assessment of the industry’s future technology requirements.

For 20 years, SEMATECH® (www.sematech.org), the global consortium of leading semiconductor manufacturers, has set global direction, enabled flexible collaboration, and bridged strategic R&D to manufacturing. Today, we continue accelerating the next technology revolution with our nanoelectronics and emerging technology partners.

For more information, please click here

Contacts:
SEMATECH
Anne Englander
512-356-7155

Copyright © Business Wire 2008

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

News and information

INRS and ELI deepen strategic partnership to train the next generation in laser science:PhD students will benefit from international mobility and privileged access to cutting-edge infrastructure June 6th, 2025

Electrifying results shed light on graphene foam as a potential material for lab grown cartilage June 6th, 2025

Quantum computers simulate fundamental physics: shedding light on the building blocks of nature June 6th, 2025

A 1960s idea inspires NBI researchers to study hitherto inaccessible quantum states June 6th, 2025

Chip Technology

A 1960s idea inspires NBI researchers to study hitherto inaccessible quantum states June 6th, 2025

Programmable electron-induced color router array May 14th, 2025

Enhancing power factor of p- and n-type single-walled carbon nanotubes April 25th, 2025

Ultrafast plasmon-enhanced magnetic bit switching at the nanoscale April 25th, 2025

Announcements

INRS and ELI deepen strategic partnership to train the next generation in laser science:PhD students will benefit from international mobility and privileged access to cutting-edge infrastructure June 6th, 2025

Electrifying results shed light on graphene foam as a potential material for lab grown cartilage June 6th, 2025

Quantum computers simulate fundamental physics: shedding light on the building blocks of nature June 6th, 2025

A 1960s idea inspires NBI researchers to study hitherto inaccessible quantum states June 6th, 2025

Events/Classes

Institute for Nanoscience hosts annual proposal planning meeting May 16th, 2025

A New Blue: Mysterious origin of the ribbontail ray’s electric blue spots revealed July 5th, 2024

Researchers demonstrate co-propagation of quantum and classical signals: Study shows that quantum encryption can be implemented in existing fiber networks January 20th, 2023

CEA & Partners Present ‘Powerful Step Towards Industrialization’ Of Linear Si Quantum Dot Arrays Using FDSOI Material at VLSI Symposium: Invited paper reports 3-step characterization chain and resulting methodologies and metrics that accelerate learning, provide data on device pe June 17th, 2022

Printing/Lithography/Inkjet/Inks/Bio-printing/Dyes

Presenting: Ultrasound-based printing of 3D materials—potentially inside the body December 8th, 2023

Simple ballpoint pen can write custom LEDs August 11th, 2023

Disposable electronics on a simple sheet of paper October 7th, 2022

Newly developed technique to improve quantum dots color conversion performance: Researchers created perovskite quantum dot microarrays to achieve better results in full-color light-emitting devices and expand potential applications June 10th, 2022

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project