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December 13th, 2007

SRC awards Glasgow $2.5m

Abstract:
The university-research consortium Semiconductor Research Corp (SRC) of Research Triangle Park, NC, USA is funding Scotland's University of Glasgow in a $2.5m, three-year project ( from 1 January) to identify the best p-channel material to scale minimum MOSFET feature sizes in CMOS devices (including gate length) down to the 8nm technology generation.

By exploiting compound semiconductor materials for the p-type channel, the Glasgow research is expected to enable the shrinking of silicon chips for a further 4-6 years beyond previous projections for the miniaturization roadmap .

Source:
semiconductor-today.com

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