Home > News > JSR and IBM Collaborate on Next-Gen Lithography, Self-Assembly
December 8th, 2007
JSR and IBM Collaborate on Next-Gen Lithography, Self-Assembly
Abstract:
IBM and JSR will collaborate on a set of exploratory research projects focused on new materials for future lithography technologies, including self-assembly techniques. "Our joint research with JSR helps us do even more exploratory work at critical mass," said Gian-Luca Bona, senior manager, science and technology, at the IBM Almaden Research Center (San Jose). "This partnership combines the deep chemistry and materials science expertise of IBM Research and JSR's record of innovation and technology impact in the electronic chemicals arena."
Source:
semiconductor.net
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