Home > News > Rohm and Haas Purchases Coating Cluster from SUSS MicroTec for Resist and Spin-on Dielectric Qualification
September 11th, 2007
Rohm and Haas Purchases Coating Cluster from SUSS MicroTec for Resist and Spin-on Dielectric Qualification
Abstract:
SUSS MicroTec (FWB:SMH) (GER:SMH) announced today it has received the first order for its new Gamma XPress coat / develop cluster from Rohm and Haas Electronics Materials, a world leader in the development and manufacture of electronic materials for the semiconductor markets. The system from SUSS MicroTec will be used by Rohm and Haas Electronic Materials to develop, characterize and optimize photodielectrics and both thick and thin photoresists. The SUSS Gamma XPress was chosen over alternative equipment due to its superior thick resist processing capability and its bridge tool design that permits concurrent handling of wafers with different sizes without mechanical changeover.
Source:
SUSS MicroTec
Bookmark:
| Related News Press |
Chip Technology
Lab to industry: InSe wafer-scale breakthrough for future electronics August 8th, 2025
A 1960s idea inspires NBI researchers to study hitherto inaccessible quantum states June 6th, 2025
Programmable electron-induced color router array May 14th, 2025
Enhancing power factor of p- and n-type single-walled carbon nanotubes April 25th, 2025
Announcements
Sensors innovations for smart lithium-based batteries: advancements, opportunities, and potential challenges August 8th, 2025
Deciphering local microstrain-induced optimization of asymmetric Fe single atomic sites for efficient oxygen reduction August 8th, 2025
Japan launches fully domestically produced quantum computer: Expo visitors to experience quantum computing firsthand August 8th, 2025
ICFO researchers overcome long-standing bottleneck in single photon detection with twisted 2D materials August 8th, 2025
Tools
Japan launches fully domestically produced quantum computer: Expo visitors to experience quantum computing firsthand August 8th, 2025
Rice researchers harness gravity to create low-cost device for rapid cell analysis February 28th, 2025
New 2D multifractal tools delve into Pollock's expressionism January 17th, 2025
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||