Home > News > Xyalis Announce an Advanced Methodology for Building CMP Models
June 1st, 2007
Xyalis Announce an Advanced Methodology for Building CMP Models
Abstract:
XYALIS announce today that thanks to 'non destructive' nanometric measurement equipment's, XYALIS is able to build Chermo Mechanical Planarization (CMP) models. These models are used for estimating the critical areas where dummy filling is needed to smooth the thickness variation. With advanced processes starting at 65nm and below, using a model based estimator is a must to find critical areas and reduce the number of dummy tiles inserted and thus, reduce the parasitics and yield lost. This measures are available within a collaboration of XYALIS and CIME - Nanotech (Minatec Research Center) in Grenoble.
Source:
fullpress.it
Bookmark:
| Related News Press |
Chip Technology
New ocelot chip makes strides in quantum computing: Based on "cat qubits," the technology provides a new way to reduce quantum errors February 28th, 2025
Enhancing transverse thermoelectric conversion performance in magnetic materials with tilted structural design: A new approach to developing practical thermoelectric technologies December 13th, 2024
Bringing the power of tabletop precision lasers for quantum science to the chip scale December 13th, 2024
Announcements
Closing the gaps — MXene-coating filters can enhance performance and reusability February 28th, 2025
Rice researchers harness gravity to create low-cost device for rapid cell analysis February 28th, 2025
Tools
Rice researchers harness gravity to create low-cost device for rapid cell analysis February 28th, 2025
New 2D multifractal tools delve into Pollock's expressionism January 17th, 2025
Turning up the signal November 8th, 2024
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||