Home > News > IBM sees immersion at 22nm, pushes out EUV
February 24th, 2007
IBM sees immersion at 22nm, pushes out EUV
Abstract:
IBM Corp. Friday (Feb. 23) outlined its lithography roadmap, saying that it would extend 193-nm immersion lithography down to the 22-nm node for logic production. In other words, extreme ultraviolet (EUV) lithography could get pushed out again, as the technology is not expected to be ready for the early development work at the 22-nm node for logic, according to IBM's lithography guru.
Source:
eetimes.com
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