Home > News > IBM sees immersion at 22nm, pushes out EUV
February 24th, 2007
IBM sees immersion at 22nm, pushes out EUV
Abstract:
IBM Corp. Friday (Feb. 23) outlined its lithography roadmap, saying that it would extend 193-nm immersion lithography down to the 22-nm node for logic production. In other words, extreme ultraviolet (EUV) lithography could get pushed out again, as the technology is not expected to be ready for the early development work at the 22-nm node for logic, according to IBM's lithography guru.
Source:
eetimes.com
Bookmark:
| Related News Press |
Chip Technology
Lab to industry: InSe wafer-scale breakthrough for future electronics August 8th, 2025
A 1960s idea inspires NBI researchers to study hitherto inaccessible quantum states June 6th, 2025
Programmable electron-induced color router array May 14th, 2025
Announcements
Rice membrane extracts lithium from brines with greater speed, less waste October 3rd, 2025
Researchers develop molecular qubits that communicate at telecom frequencies October 3rd, 2025
Next-generation quantum communication October 3rd, 2025
"Nanoreactor" cage uses visible light for catalytic and ultra-selective cross-cycloadditions October 3rd, 2025
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||