Nanotechnology Now - Press Release: Picosun's ALD reactor installed at University of Helsinki

Home > Press > Picosun's ALD reactor installed at University of Helsinki

Abstract:
University of Helsinki announced that Picosun Oy's SUNALE™ R-150 ALD reactor has been installed and is performing well at the Laboratory of Inorganic Chemistry

Picosun's ALD reactor installed at University of Helsinki

Posted on January 24, 2006

University of Helsinki announced that Picosun Oy's SUNALE™ R-150 ALD reactor has been installed and is performing well at the Laboratory of Inorganic Chemistry. In making the announcement, Professor Mikko Ritala stated:

"Picosun's SUNALE™ ALD reactor has now been successfully delivered and installed. The first test runs gave excellent results on 150 mm wafers. We are very excited about this latest addition to our ALD reactor portfolio. One interesting pathway in near future research will be a modification of the reactor with the new feature we have invented and further developed in collaboration with Picosun. This will add a new dimension to ALD processing."

Juhana Kostamo, COO of Picosun Oy, commented: "I am very glad that University of Helsinki, one of the most highly regarded institutions of the ALD society, has approved an ALD reactor from Picosun. The design of our ALD reactors has matured to the gamma level which enables us to start high volume manufacturing of SUNALE™ R-series ALD tools. We are now drastically scaling up our production due to the strong customer interest. This, together with the optimized production processes, enables us to significantly lower our production costs, which will turn to the benefit of our customers."

Picosun Oy's SUNALE™ R-150 ALD reactor at University of Helsinki is equipped with the Advanced Control System for nanolaminate multilayer deposition and the proprietary Picosolid™ Heated Source System for solid and liquid low vapor pressure precursors.

SUNALE™ R-series ALD reactors are optimized for Atomic Layer Deposition method especially for MEMS and nanotechnology research and application development purposes.

Gamma level SUNALE™ R-series ALD reactors can be equipped with temperature stabilized Picosolution™ liquid sources, ventilated Picogases™ gas cabinets, proprietary new type Picosolid™ and Picosolid™ Booster solid sources for high and low vapour pressure solids and several different types of Picoloader™ load locks for manual, semi-automatic or fully automated cassette-to-cassette operation.

For more information, please contact Professor Mikko Ritala, tel. +358 9 191 50 193, mikko.ritala@helsinki.fi or COO Juhana Kostamo, tel. +358 50 3699 565, email juhana.kostamo@picosun.com.

####

Media Contact:
Juhana Kostamo
+358 50 3699 565
Fax: + 358 20 722 7012
juhana.kostamo@picosun.com

Copyright © Picosun Oy

If you have a comment, please Contact us.

Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.

Bookmark: