Home > News > New look for nanofabrication
December 6th, 2004
New look for nanofabrication
Abstract:
Physicists in Germany have developed a new approach to atom lithography that can beat the classical diffraction limit by a factor of two. The technique, developed by Markus Oberthaler and colleagues at the universities of Heidelberg and Konstanz, exploits quantum aspects of the interaction between light and matter.
Source:
nanotechweb
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