Home > News > New look for nanofabrication
December 6th, 2004
New look for nanofabrication
Abstract:
Physicists in Germany have developed a new approach to atom lithography that can beat the classical diffraction limit by a factor of two. The technique, developed by Markus Oberthaler and colleagues at the universities of Heidelberg and Konstanz, exploits quantum aspects of the interaction between light and matter.
Source:
nanotechweb
Bookmark:
| Related News Press |
Discoveries
Researchers develop molecular qubits that communicate at telecom frequencies October 3rd, 2025
Next-generation quantum communication October 3rd, 2025
"Nanoreactor" cage uses visible light for catalytic and ultra-selective cross-cycloadditions October 3rd, 2025
Announcements
Rice membrane extracts lithium from brines with greater speed, less waste October 3rd, 2025
Researchers develop molecular qubits that communicate at telecom frequencies October 3rd, 2025
Next-generation quantum communication October 3rd, 2025
"Nanoreactor" cage uses visible light for catalytic and ultra-selective cross-cycloadditions October 3rd, 2025
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||