Home > News > IMEC claims silicide gate could enable 45-nm process
October 16th, 2004
IMEC claims silicide gate could enable 45-nm process
Abstract:
IMEC has demonstrated the integration of fully-silicided NiSi gates on top of high-k gate stacks, claiming a potential breakthrough that would enable development of a 45-nm manufacturing process.
Source:
eetimes
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