Home > News > 'Solid immersion' probed for maskless litho
September 14th, 2004
'Solid immersion' probed for maskless litho
Abstract:
The current craze in lithography is immersion technology. But researchers from the University of Arizona have put a new twist on the technology, by devising so-called "solid immersion." In a paper at the Bacus Symposium for Photomask Technology, the University of Arizona is expected to describe the means of enabling maskless lithography, by using "solid immersion lens nano-probes."
Source:
EETimes
Bookmark:
| Related News Press |
Chip Technology
A 1960s idea inspires NBI researchers to study hitherto inaccessible quantum states June 6th, 2025
Programmable electron-induced color router array May 14th, 2025
Enhancing power factor of p- and n-type single-walled carbon nanotubes April 25th, 2025
Ultrafast plasmon-enhanced magnetic bit switching at the nanoscale April 25th, 2025
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||