Home > News > Lithography gear switches for 65 nm
July 12th, 2004
Lithography gear switches for 65 nm
Abstract:
With 157-nanometer optical lithography having "missed the window" for the upcoming 65-nm process node, International Sematech has all but slammed the door on the decade-long 157-nm development effort. The consortium said last week that it is opening an Immersion Technology Center (iTC) here to focus on 193-nm immersion lithography, with an eye toward possibly extending the technology to the 32-nm process node.
Source:
EETimes
Bookmark:
| Related News Press |
Chip Technology
Lab to industry: InSe wafer-scale breakthrough for future electronics August 8th, 2025
A 1960s idea inspires NBI researchers to study hitherto inaccessible quantum states June 6th, 2025
Programmable electron-induced color router array May 14th, 2025
Enhancing power factor of p- and n-type single-walled carbon nanotubes April 25th, 2025
Tools
Japan launches fully domestically produced quantum computer: Expo visitors to experience quantum computing firsthand August 8th, 2025
Rice researchers harness gravity to create low-cost device for rapid cell analysis February 28th, 2025
New 2D multifractal tools delve into Pollock's expressionism January 17th, 2025
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||