Home > News > Nanoimprint litho progress reported at SPIE
February 25th, 2004
Nanoimprint litho progress reported at SPIE
Abstract:
Steady progress in nanoimprint lithography reported Tuesday (Feb.24) at the SPIE conference here definitely caught the attention of attendees. In six papers, researchers from Hewlett-Packard Labs and from three nanoimprint equipment makers all reported the fabrication of structures or devices with existing equipment. In addition, progress in the materials field was described.
Source:
EETimes
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