Home > News > Fluid scheme yields high-dielectric films
February 4th, 2004
Fluid scheme yields high-dielectric films
Abstract:
A fundamentally new approach to creating nanostructures by forming them with supercritical fluids could be used to make dielectric films used in semiconductor processes. The approach is being forged in a joint project between the University of Massachusetts Amherst and Novellus Systems Inc.
Source:
EETimes
Bookmark:
| Related News Press |
Discoveries
Breaking carbon–hydrogen bonds to make complex molecules November 8th, 2024
Exosomes: A potential biomarker and therapeutic target in diabetic cardiomyopathy November 8th, 2024
Turning up the signal November 8th, 2024
Nanofibrous metal oxide semiconductor for sensory face November 8th, 2024
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||