Nanotechnology Now

Our NanoNews Digest Sponsors
Heifer International



Home > News > ASML, Canon, Nikon take dip into immersion litho

February 28th, 2003

ASML, Canon, Nikon take dip into immersion litho

Abstract:
ASML Holding NV, Canon Inc., and Nikon Corp. separately disclosed they are taking the first steps in what could be the next "breakthrough" in chip production: immersion lithography.

Source:
EETimes

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

New material to make next generation of electronics faster and more efficient With the increase of new technology and artificial intelligence, the demand for efficient and powerful semiconductors continues to grow November 8th, 2024

Nanofibrous metal oxide semiconductor for sensory face November 8th, 2024

New discovery aims to improve the design of microelectronic devices September 13th, 2024

Groundbreaking precision in single-molecule optoelectronics August 16th, 2024

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books



NNN
The Hunger Project