Nanotechnology Now

Our NanoNews Digest Sponsors
Heifer International



Home > News > Stitching accuracy key to Nikon's EPL prototype

February 14th, 2003

Stitching accuracy key to Nikon's EPL prototype

Abstract:
Nikon Corp. said it was a breakthrough in sub-field stitching accuracy that allowed the creation of a prototype of its electron-beam projection lithography (EPL) system. The sub-field stitching accuracy, which governs how well a complete die is characterized by several sub-field e-beam exposures, has been described as the main hurdle facing the development of EPL.

Source:
* SiliconStrategies

Bookmark:
Delicious Digg Newsvine Google Yahoo Reddit Magnoliacom Furl Facebook

Related News Press

Chip Technology

New material to make next generation of electronics faster and more efficient With the increase of new technology and artificial intelligence, the demand for efficient and powerful semiconductors continues to grow November 8th, 2024

Nanofibrous metal oxide semiconductor for sensory face November 8th, 2024

New discovery aims to improve the design of microelectronic devices September 13th, 2024

Groundbreaking precision in single-molecule optoelectronics August 16th, 2024

NanoNews-Digest
The latest news from around the world, FREE




  Premium Products
NanoNews-Custom
Only the news you want to read!
 Learn More
NanoStrategies
Full-service, expert consulting
 Learn More











ASP
Nanotechnology Now Featured Books




NNN

The Hunger Project