Home > News > Extreme Ultraviolet Lithography Reaches Commercial Sector
February 13th, 2003
Extreme Ultraviolet Lithography Reaches Commercial Sector
Abstract:
The Federal Laboratory Consortium for Technology Transfer has granted the Extreme Ultraviolet Lithography (EUVL) project an Excellency in Technology Transfer award for technology that will lead to microprocessors that are tens of times faster than today's most powerful chips.
Source:
SpaceDaily
Bookmark:
| Related News Press |
Chip Technology
Nanofibrous metal oxide semiconductor for sensory face November 8th, 2024
New discovery aims to improve the design of microelectronic devices September 13th, 2024
Groundbreaking precision in single-molecule optoelectronics August 16th, 2024
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||