Nanotechnology Now - Press Release: Introducing Low Edge Shift IR Precision Cut Filters

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Abstract:
NanoOpto's IR cut filters are fabricated with a conformal coating atomic layer deposition (ALD) process which produces a higher quality filter with better thickness uniformity than conventional techniques such as PVD, vacuum e-beam or sputtering.

Introducing Low Edge Shift IR Precision Cut Filters

Somerset, NJ | Posted on February 21st, 2008

NanoOpto, a division of API Nanotronics (NASDAQ OTC APIO.OB) is pleased to introduce low edge shift IR Cut Filters for high performance digital imaging applications.

NanoOpto's IR cut filters are fabricated with a conformal coating atomic layer deposition (ALD) process which produces a higher quality filter with better thickness uniformity than conventional techniques such as PVD, vacuum e-beam or sputtering. In addition, NanoOpto filters offer reduced edge shift without sacrificing transmission and rejection performance. The reduced edge shift of the filters allows closer placement to the device image plane thereby reducing package size.

These IR Filters have a pass wavelength range of 420-625 nm, with transmission in pass range of >95% for normal incidence, cut off wavelength of 675-1000 nm with transmission in cut off range of <3% and edge shift of <23 nm @ 30° incidence. NanoOpto's IR precision cut filters can be produced on BK7 or similar substrates with
thickness ranging from 0.2 mm to 1.2 mm and have an operating temperature range of
-40° to 80°C. Please contact NanoOpto for custom specifications.

NanoOpto's IR filters are currently used in Medical, Security, Military and
Consumer Imaging applications.

Pricing at 100 piece quantity of a 4" square IR Cut filter on BK7 substrate
is $8,000/ea.

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For more information, please click here

Contacts:
Karen J Robinson
631-862-9489

Technical Contact:
Thomas Tombler, PhD
732-627-0808 ext 2295

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