Nanotechnology Now

Our NanoNews Digest Sponsors

Home > News > FEI Launches Top-of-the-Line Research Dualbeam

September 1st, 2006

FEI Launches Top-of-the-Line Research Dualbeam

Abstract:
The next generation of combined focused ion beam (FIB) and scanning electron microscope (SEM) technology for research will be unveiled today when FEI Company (Nasdaq: FEIC) releases its all-new Helios NanoLab(TM) DualBeam(TM) at Microscopy and Microanalysis 2006 in Chicago.

Source:
thomasnet.com

Bookmark:

Related News Press

Announcements

Development of 'transparent stretchable substrate' without image distortion could revolutionize next-generation displays Overcoming: Poisson's ratio enables fully transparent, distortion-free, non-deformable display substrates February 28th, 2025

Unraveling the origin of extremely bright quantum emitters: Researchers from Osaka University have discovered the fundamental properties of single-photon emitters at an oxide/semiconductor interface, which could be crucial for scalable quantum technology February 28th, 2025

Closing the gaps — MXene-coating filters can enhance performance and reusability February 28th, 2025

Rice researchers harness gravity to create low-cost device for rapid cell analysis February 28th, 2025

Tools

Rice researchers harness gravity to create low-cost device for rapid cell analysis February 28th, 2025

New 2D multifractal tools delve into Pollock's expressionism January 17th, 2025

New material to make next generation of electronics faster and more efficient With the increase of new technology and artificial intelligence, the demand for efficient and powerful semiconductors continues to grow November 8th, 2024

Turning up the signal November 8th, 2024

	The latest news from around the world, FREE

Premium Products
	Only the news you want to read!  Learn More
	Full-service, expert consulting  Learn More

Nanotechnology Now Featured Books

© Copyright 1999-2023 7th Wave, Inc. All Rights Reserved

PRIVACY POLICY :: CONTACT US :: STATS :: SITE MAP :: ADVERTISE