Home > News > 11th International Chemical-Mechanical Planarization Symposium
August 7th, 2006
11th International Chemical-Mechanical Planarization Symposium
Abstract:
More than 100 of the world’s premier researchers, academics, high technology companies and suppliers will gather in Lake Placid August 13 – 16 for the 11th International Chemical-Mechanical Planarization (CMP) Symposium, sponsored by Clarkson’s Center for Advanced Materials Processing (CAMP).
Source:
Clarkson University
Bookmark:
| Related News Press |
Materials/Metamaterials/Magnetoresistance
Researchers unveil a groundbreaking clay-based solution to capture carbon dioxide and combat climate change June 6th, 2025
A 1960s idea inspires NBI researchers to study hitherto inaccessible quantum states June 6th, 2025
Institute for Nanoscience hosts annual proposal planning meeting May 16th, 2025
Announcements
Electrifying results shed light on graphene foam as a potential material for lab grown cartilage June 6th, 2025
Quantum computers simulate fundamental physics: shedding light on the building blocks of nature June 6th, 2025
A 1960s idea inspires NBI researchers to study hitherto inaccessible quantum states June 6th, 2025
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||