Home > News > pSivida Announces Korean Patent
June 16th, 2005
pSivida Announces Korean Patent
Abstract:
This is an important patent covering the electronic-based properties of BioSilicon(TM) in the stimulation of orthopaedic tissue repair and re-engineering where scaffolds are required to support new bone growth. The technology also has application for treatment of fractures that do not heal, such as "bone non-union."
Source:
businesswire
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