Home > Press > Ambios Releases Powerful New Software For Metrology Tools
Abstract:
Automated features improve repeatability and time saving functions
The latest software release from Ambios Technology,
Inc. adds sophisticated automated features that improve repeatability and time saving
functions in use with their high resolution optical profilers for the general industrial and
academic marketplaces.
With the new software version (Version 5.5.2) an operator has programming control to
preset stage locations for repetitive measurements integral to accurate data acquisition,
timely throughput, and decreased errors in operation. With the programmable stage preset
functionality, an operator can program up to ten stage positions ensuring repetitive
measurements, and allow easier sample interchanging without the need for reprogramming
stage position with every load. Other new features include: step detection, auto level, auto
measure, scan stitching, and multiple profile loads. These functions enable operators to
extend the profile range of the instrument, allowing larger scan lengths, repeat multiple
scans with the same parameters, and view analysis data in “batch” format.
The move toward more automated capabilities is in part a response to consumer requests in
Research and Development and other markets, as well as a continued company
commitment to enhancing its surface analysis products. Ambios Technology’s profilers
continue to be an ideal measurement tool in the R&D world, as well as a capable tool in the
MEMS and nanotechnology fields.
Issuers of news releases, not 7th Wave, Inc. or Nanotechnology Now, are solely responsible for the accuracy of the content.
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