Home > News > Immersion effort looks to new crystals, liquids
September 15th, 2004
Immersion effort looks to new crystals, liquids
Abstract:
Adopting immersion lithography appears at this point to be nearly pain-free: Just add water and, voila, those 193nm tools can be pushed well past their expected life. But taking immersion even further, to a half-pitch of 45nm and beyond, will mean more than just adding fluids with a higher refractive index, leading lithographers maintain.
Source:
EETimes
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