Home > News > RIT Researchers Develop Next-Gen Image-Resolution Technology
January 26th, 2004
RIT Researchers Develop Next-Gen Image-Resolution Technology
Abstract:
A team of researchers at Rochester Institute of Technology has developed the ability to use optical microlithography to produce semiconductor device geometry as small as 38 nanometers. The team, led by Bruce Smith, Intel Professor of Microelectronic Engineering and associate dean of the Kate Gleason College of Engineering, used a prototype liquid immersion nanolithography tool developed at RIT.
Source:
Ascribe
Bookmark:
| Related News Press |
Chip Technology
Lab to industry: InSe wafer-scale breakthrough for future electronics August 8th, 2025
A 1960s idea inspires NBI researchers to study hitherto inaccessible quantum states June 6th, 2025
Programmable electron-induced color router array May 14th, 2025
Enhancing power factor of p- and n-type single-walled carbon nanotubes April 25th, 2025
Tools
Japan launches fully domestically produced quantum computer: Expo visitors to experience quantum computing firsthand August 8th, 2025
Rice researchers harness gravity to create low-cost device for rapid cell analysis February 28th, 2025
New 2D multifractal tools delve into Pollock's expressionism January 17th, 2025
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||