Home > News > RIT Researchers Develop Next-Gen Image-Resolution Technology
January 26th, 2004
RIT Researchers Develop Next-Gen Image-Resolution Technology
Abstract:
A team of researchers at Rochester Institute of Technology has developed the ability to use optical microlithography to produce semiconductor device geometry as small as 38 nanometers. The team, led by Bruce Smith, Intel Professor of Microelectronic Engineering and associate dean of the Kate Gleason College of Engineering, used a prototype liquid immersion nanolithography tool developed at RIT.
Source:
Ascribe
Bookmark:
| Related News Press |
Chip Technology
Nanofibrous metal oxide semiconductor for sensory face November 8th, 2024
New discovery aims to improve the design of microelectronic devices September 13th, 2024
Groundbreaking precision in single-molecule optoelectronics August 16th, 2024
Tools
Turning up the signal November 8th, 2024
Quantum researchers cause controlled ‘wobble’ in the nucleus of a single atom September 13th, 2024
Faster than one pixel at a time – new imaging method for neutral atomic beam microscopes developed by Swansea researchers August 16th, 2024
 |
||
 |
||
| The latest news from around the world, FREE | ||
 |
||
|
|
||
| Premium Products | ||
 |
||
|
Only the news you want to read!
Learn More |
||
 |
||
|
Full-service, expert consulting
Learn More |
||
|
|
||