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Martini Tech Inc.
 | June 2nd, 2014 Alternatives to EUV lithography for sub-10nm patterning Martini Tech Inc Martini Tech Semiconductor volume production using EUV lithography has proved elusive so far due to multiple delays and by lack of a viable light source. But is there any alternative to optical stepper lithography for sub 10-nm patterning? Read the Whole Article |
| April 20th, 2014 The long-term implications of the Canon-Molecular Imprints deal Martini Tech Inc Martini Tech The deal, announced about two months ago, has the potentiality of re-shaping the whole nanoimprint industry by moving its focus from niche applications to IC-patterning Read the Whole Article |
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